CobaltMaghrebV1, Main, Exploration, bibRecord, 000447

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Identifieur interne : 000447 ( Main/Exploration ); précédent : 000446; suivant : 000448

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Auteurs : MOHAMED REDHA KHELLADI [Algérie] ; Loubna Mentar [Algérie] ; Amor Azizi [Algérie] ; Figen Kadirgan [Turquie] ; Guy Schmerber [France] ; Aziz Dinia [France]

Source :

Applied surface science [ 0169-4332 ] ; 2012.

RBID : Pascal:12-0316125

Descripteurs français

Pascal (Inist)
- Nucléation, Nanostructure, Silicium, Croissance film, Dépôt électrolytique, Cobalt, Métal transition, Si, Co.
Wicri :
- topic : Cobalt.

English descriptors

KwdEn :
- Cobalt, Electrodeposition, Film growth, Nanostructures, Nucleation, Silicon, Transition elements.

Abstract

In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106cm^-2 and 10^-5 cm² s^-1, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .

Affiliations:

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Le document en format XML

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<front><div type="abstract" xml:lang="en">In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106<sup> </sup>
cm<sup>-2</sup>
 and 10<sup>-5</sup>
 cm<sup>2</sup>
 s<sup>-1</sup>
, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .</div>
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Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Source :

Descripteurs français

English descriptors

Abstract

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